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HomeSolid State PhenomenaSolid State Phenomena Vol. 134Effect of Pressure Pulsation on Post-Etch...

Effect of Pressure Pulsation on Post-Etch Photoresist Stripping on Low-k Films in Supercritical CO₂

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Periodical:

Solid State Phenomena (Volume 134)

Pages:

341-344

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.134.341

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Online since:

November 2007

Authors:

H. Kiyose, K. Saito, I. Mizobata, T. Iwata, S. Hirae, Koichiro Saga, Hitoshi Kuniyasu, Takeshi Hattori

Keywords:

BEOL, Low-k Films, Photoresist Stripping, Post-Etch, Supercritical CO₂

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© 2008 Trans Tech Publications Ltd. All Rights Reserved

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