Effect of Pressure Pulsation on Post-Etch Photoresist Stripping on Low-k Films in Supercritical CO2

Abstract:

Article Preview

Info:

Periodical:

Solid State Phenomena (Volume 134)

Edited by:

Paul Mertens, Marc Meuris and Marc Heyns

Pages:

341-344

DOI:

10.4028/www.scientific.net/SSP.134.341

Citation:

H. Kiyose et al., "Effect of Pressure Pulsation on Post-Etch Photoresist Stripping on Low-k Films in Supercritical CO2", Solid State Phenomena, Vol. 134, pp. 341-344, 2008

Online since:

November 2007

Export:

Price:

$35.00

In order to see related information, you need to Login.

In order to see related information, you need to Login.