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HomeSolid State PhenomenaSolid State Phenomena Vol. 134Photoresist Characterization and Wet Strip after...

Photoresist Characterization and Wet Strip after Low-k Dry Etch

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Periodical:

Solid State Phenomena (Volume 134)

Pages:

325-328

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.134.325

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Online since:

November 2007

Authors:

Martine Claes, Quoc Toan Le, J. Keldermans, Els Kesters, Marcel Lux, A. Franquet, Guy Vereecke, Paul W. Mertens, M.M. Frank, Robert Carleer, P. Adriaensens, D. Vanderzande

Keywords:

BEOL, Low-K, Megasonic, Polymer Characterization, Post-Etch Photoresist, Solvent

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© 2008 Trans Tech Publications Ltd. All Rights Reserved

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