Photoresist Characterization and Wet Strip after Low-k Dry Etch

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Periodical:

Solid State Phenomena (Volume 134)

Edited by:

Paul Mertens, Marc Meuris and Marc Heyns

Pages:

325-328

DOI:

10.4028/www.scientific.net/SSP.134.325

Citation:

M. Claes et al., "Photoresist Characterization and Wet Strip after Low-k Dry Etch ", Solid State Phenomena, Vol. 134, pp. 325-328, 2008

Online since:

November 2007

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$35.00

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