Improvement of Contact Clean Using Single-Wafer Clean Process for 90nm and Beyond

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Periodical:

Solid State Phenomena (Volume 134)

Edited by:

Paul Mertens, Marc Meuris and Marc Heyns

Pages:

313-316

DOI:

10.4028/www.scientific.net/SSP.134.313

Citation:

J. W. Nam et al., "Improvement of Contact Clean Using Single-Wafer Clean Process for 90nm and Beyond ", Solid State Phenomena, Vol. 134, pp. 313-316, 2008

Online since:

November 2007

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$35.00

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