The Dependence of Chemical Mechanical Polishing Residue Removal on Post-Cleaning Treatments

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Periodical:

Solid State Phenomena (Volume 134)

Edited by:

Paul Mertens, Marc Meuris and Marc Heyns

Pages:

303-306

DOI:

10.4028/www.scientific.net/SSP.134.303

Citation:

J. G. Choi et al., "The Dependence of Chemical Mechanical Polishing Residue Removal on Post-Cleaning Treatments ", Solid State Phenomena, Vol. 134, pp. 303-306, 2008

Online since:

November 2007

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$35.00

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