Effects of Bias, Pressure and Temperature in Plasma Damage of Ultra Low-k Films

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Periodical:

Solid State Phenomena (Volume 134)

Edited by:

Paul Mertens, Marc Meuris and Marc Heyns

Pages:

317-320

DOI:

10.4028/www.scientific.net/SSP.134.317

Citation:

A.M. Urbanowicz et al., "Effects of Bias, Pressure and Temperature in Plasma Damage of Ultra Low-k Films ", Solid State Phenomena, Vol. 134, pp. 317-320, 2008

Online since:

November 2007

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$35.00

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