Mechanism and Principles of Post Etch Al Cleaning with Inorganic Acids

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Periodical:

Solid State Phenomena (Volume 134)

Edited by:

Paul Mertens, Marc Meuris and Marc Heyns

Pages:

363-366

DOI:

10.4028/www.scientific.net/SSP.134.363

Citation:

S. Verhaverbeke et al., "Mechanism and Principles of Post Etch Al Cleaning with Inorganic Acids", Solid State Phenomena, Vol. 134, pp. 363-366, 2008

Online since:

November 2007

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$35.00

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