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HomeSolid State PhenomenaSolid State Phenomena Vol. 134Mechanism and Principles of Post Etch Al Cleaning...

Mechanism and Principles of Post Etch Al Cleaning with Inorganic Acids

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Ultra Clean Processing of Semiconductor Surfaces VIII

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Periodical:

Solid State Phenomena (Volume 134)

Pages:

363-366

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.134.363

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Online since:

November 2007

Authors:

Steven Verhaverbeke, Roman Gouk, Jim Papanu, Han Wen Chen

Keywords:

Al Cleaning, Dilute Sulfuric Peroxide DSP, Post-Etch Cleaning, Sulfuric Acid

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© 2008 Trans Tech Publications Ltd. All Rights Reserved

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