Spectroscopic Studies of Iron and Chromium in Germanium

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Abstract:

We report on the electronic properties of Fe and Cr in n-type germanium using conventional and Laplace DLTS techniques, which in the case of Schottky barriers, are restricted to levels located in the upper half of the band gap. In this work we present extensive DLTS and Laplace DLTS results, re-examining various basic properties of Fe and Cr in n-type Ge samples. In addition our analysis bring new insights into the microscopic behavior of these two chemical species such as their interactions with hydrogen present as an unwanted contaminant, giving rise to the generation of other related levels in the band gap.

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Solid State Phenomena (Volumes 178-179)

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285-288

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August 2011

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© 2011 Trans Tech Publications Ltd. All Rights Reserved

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[1] P. Blood and J. W. Orton, The Electrical Characterization of Semiconductors: Majority Carriers and Electron States, Academic, London, 1992.

Google Scholar

[2] P. Clauws, J. Van Gheluwe, J. Lauwaert, E. Simoen, J. Vanhellemont, M. Meuris, and A. Theuwis, Physica B 401-402 (2007) 188.

DOI: 10.1016/j.physb.2007.08.143

Google Scholar

[3] P. Clauws and E. Simoen, Mater. Sci. Semicond. Process. 9 (2006) 546.

Google Scholar

[4] E. Simoen, C. Claeys, Metals in Germanium, in: C. Claeys, E. Simoen, Germanium-Based Technologies: From Materials to Devices, Elsevier Ltd, London, 2007, pp.131-187.

DOI: 10.1016/b978-008044953-1/50009-0

Google Scholar

[5] S. Forment, J. Vanhellemont, P. Clauws, J. Van Steenbergen, S. Sioncke, M. Meuris, E. Simoen, and A. Theuwis, Mater. Sci. Semicond. Process. 9 (2006) 559.

DOI: 10.1016/j.mssp.2006.08.048

Google Scholar

[6] Gaubas E, Vanhellemont J, Simoen E, Romandic I, Geens W, Clauws P., Physica B 401–402 (2007) 222.

DOI: 10.1016/j.physb.2007.08.151

Google Scholar

[7] Ben Depuydt, Antoon Theuwis, Igor Romandic, Materials Science in Semiconductor Processing 9 (2006) 437–443.

DOI: 10.1016/j.mssp.2006.08.002

Google Scholar

[8] Matteo Bosi, Giovanni Attolini, Progress in Crystal Growth and Characterization of Materials 56 (2010) 146-174.

Google Scholar

[9] J. Lauwaert, J. Van Gheluwe, J. Vanhellemont, E. Simoen and P. Clauws, Journal of applied physics 105 (2009) 073707.

DOI: 10.1063/1.3082124

Google Scholar

[10] P. Clauws, J. Lauwaert, The 5th International Symposium on Advanced Science and Technology of Silicon Materials (JSPS Si Symposium),Nov. 10-14, Kona, Hawaii, USA (2008).

Google Scholar

[11] J. Weber, S. Knack and J.-U. Sachse, Physica B 273–274 (1999) 429.

Google Scholar