Process Parameter Control for BEOL TiN Hard Mask Etch-Back

Harald Okorn-Schmidt; Philipp Engesser; Manuel Linder; Jörg Hofer-Moser

doi:10.4028/www.scientific.net/SSP.282.238

Paper Titles

AlCu Pitting Prevention in Post Etch Cleaning
p.213

Investigation of Defectivity Coming from the Back Side of Wafers during AlCu Polymer Removal Processes Performed in a Batch Spray Tool
p.220

Aluminum Cleaning on Single Wafer Tool: A Case Study with Diluted HF
p.226

Atomic Layer Deposition of TiN below 600 K Using N₂H₄
p.232

Process Parameter Control for BEOL TiN Hard Mask Etch-Back
p.238

BEOL Post-Etch Clean Robustness Improvement with Ultra-Diluted Hf for 28nm Node
p.244

Optimization of Wet Strip for Metal Void Reduction in Trench First Metal Hard Mask Back End of Line Process
p.250

Corrosion of Co in BEOL interconnects in dilute HF solution
p.256

Effect of Cleaning Chemistries on Cobalt: Surface Chemistries and Electrical Characterization
p.263

HomeSolid State PhenomenaSolid State Phenomena Vol. 282Process Parameter Control for BEOL TiN Hard Mask...

Process Parameter Control for BEOL TiN Hard Mask Etch-Back

Abstract:

In this paper we demonstrate an effective process control mechanism to significantly improve on the process performance of a BEOL post-etch cleaning process with an integrated partial or complete removal of the TiN HM (hard mask) layer by so called formulated chemistries on a single wafer processing tool. The novel process control mechanism enables a 50% reduction in chemical consumption while achieving an at least equivalent TiN etch uniformity.

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Periodical:

Solid State Phenomena (Volume 282)

Pages:

238-243

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.282.238

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Online since:

August 2018

Authors:

Harald Okorn-Schmidt*, Philipp Engesser, Manuel Linder, Jörg Hofer-Moser

Keywords:

BEOL, Chemical Stability, Cleaning, Cost of Consumable Reduction, Etch Uniformity, Fluoropolymer, Formulated Chemistry, Hydrogen Peroxide, Point of Use Temperature Control, Single Wafer Processing, Titanium Nitride Hard Mask

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References

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