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HomeSolid State PhenomenaSolid State Phenomena Vol. 346Effects of Ultrahigh Vacuum Treatments on Wet...

Effects of Ultrahigh Vacuum Treatments on Wet Chemically Cleaned Si Surfaces

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Abstract:

Ultrahigh vacuum (UHV) environment has been widely used in surface science, but UHV technology has been often considered too complex and expensive methodology for large-scale industrial use. Because the preparation of atomically smooth and clean Si surfaces has become relevant to some industrial processes, we have re-addressed the question if UHV could be utilized in these surface tasks using industrially feasible parameters. In particular, we have studied how UHV treatments might be combined with the widely used semiconductor cleaning methodology of wet chemistry.

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Periodical:

Solid State Phenomena (Volume 346)

Pages:

57-62

DOI:

https://doi.org/10.4028/p-zJ2YOT

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Online since:

August 2023

Authors:

Zahra Jahanshah Rad*, Mikko Miettinen, Marko Punkkinen, Pekka Laukkanen, Kalevi Kokko, Ville Vähänissi, Hele Savin

Keywords:

Low-Temperature Oxidation, Silicon Reconstruction, Ultrahigh Vacuum, Wet Chemical Treatment

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© 2023 Trans Tech Publications Ltd. All Rights Reserved

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