Application of Small Pulsed Ion Beams for Depth Profiling on Beveled Semiconductor Structures

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Periodical:

Solid State Phenomena (Volumes 63-64)

Edited by:

M. Kittler, O. Breitenstein, A. Endrös, W. Schröter

Pages:

465-472

DOI:

10.4028/www.scientific.net/SSP.63-64.465

Citation:

D. Krüger et al., "Application of Small Pulsed Ion Beams for Depth Profiling on Beveled Semiconductor Structures", Solid State Phenomena, Vols. 63-64, pp. 465-472, 1998

Online since:

December 1998

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$35.00

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