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HomeSolid State PhenomenaSolid State Phenomena Vols. 65-66Applications of Tetramethylammoninium Hydroxide...

Applications of Tetramethylammoninium Hydroxide (TMAH) as a Post Tungsten CMP Cleaning Mixture

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Ultra Clean Processing of Silicon Surfaces IV

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Periodical:

Solid State Phenomena (Volumes 65-66)

Pages:

105-108

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.65-66.105

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Online since:

November 1998

Authors:

M. Jolley

Keywords:

CMP, Tungsten, Wafer Cleaning

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© 1999 Trans Tech Publications Ltd. All Rights Reserved

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