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Evaluation of Cleaning Recipes Based on Ozonated Water for Pre-Gate Oxide Cleaning
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HomeSolid State PhenomenaSolid State Phenomena Vols. 65-66Post Polysilicon Etch (Incorporating DUV Resist an...

Post Polysilicon Etch (Incorporating DUV Resist an BARC) Polymer Cleaning

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Ultra Clean Processing of Silicon Surfaces IV

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Periodical:

Solid State Phenomena (Volumes 65-66)

Pages:

113-116

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.65-66.113

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Online since:

November 1998

Authors:

Simon Y.M. Chooi, Ping-Yu Ee, B.-M. Seah, Mei Sheng Zhou

Keywords:

Bottom Antireflective Coating (BARC), Polysilicon Etching, SC-1, Sulphuric-Peroxide Mixture (SPM)

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© 1999 Trans Tech Publications Ltd. All Rights Reserved

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