Post Polysilicon Etch (Incorporating DUV Resist an BARC) Polymer Cleaning

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Periodical:

Solid State Phenomena (Volumes 65-66)

Edited by:

Marc Heyns, Marc Meuris and Paul Mertens

Pages:

113-116

DOI:

10.4028/www.scientific.net/SSP.65-66.113

Citation:

S. Y.M. Chooi et al., "Post Polysilicon Etch (Incorporating DUV Resist an BARC) Polymer Cleaning", Solid State Phenomena, Vols. 65-66, pp. 113-116, 1999

Online since:

November 1998

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Price:

$35.00

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