Dynamics of Mass Transfer on a Wafer Surface in Ozonated-Water Processing for Photoresist Removal

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Periodical:

Solid State Phenomena (Volumes 65-66)

Edited by:

Marc Heyns, Marc Meuris and Paul Mertens

Pages:

157-160

DOI:

10.4028/www.scientific.net/SSP.65-66.157

Citation:

N. Narayanswami and S. Nelson, "Dynamics of Mass Transfer on a Wafer Surface in Ozonated-Water Processing for Photoresist Removal", Solid State Phenomena, Vols. 65-66, pp. 157-160, 1999

Online since:

November 1998

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Price:

$35.00

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