Angle Resolved XPS Characterization of the Formation of Cl and Br Bonds in Poly-Silicon Etching and Its Cleaning

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Periodical:

Solid State Phenomena (Volumes 65-66)

Edited by:

Marc Heyns, Marc Meuris and Paul Mertens

Pages:

153-156

DOI:

10.4028/www.scientific.net/SSP.65-66.153

Citation:

Y.B. Kim et al., "Angle Resolved XPS Characterization of the Formation of Cl and Br Bonds in Poly-Silicon Etching and Its Cleaning", Solid State Phenomena, Vols. 65-66, pp. 153-156, 1999

Online since:

November 1998

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$35.00

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