A Novel Resist and Post-Etch Residue Removal Process Using Ozonated Chemistry

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Periodical:

Solid State Phenomena (Volumes 65-66)

Edited by:

Marc Heyns, Marc Meuris and Paul Mertens

Pages:

165-168

DOI:

10.4028/www.scientific.net/SSP.65-66.165

Citation:

S. De Gendt et al., "A Novel Resist and Post-Etch Residue Removal Process Using Ozonated Chemistry", Solid State Phenomena, Vols. 65-66, pp. 165-168, 1999

Online since:

November 1998

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$35.00

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