XPS Study of the Cleaning Efficiency by Ozone Processes of the Protective Films Formed by Reactive Ion Etching of Co and Ti Silicide

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Periodical:

Solid State Phenomena (Volumes 65-66)

Edited by:

Marc Heyns, Marc Meuris and Paul Mertens

Pages:

139-142

DOI:

10.4028/www.scientific.net/SSP.65-66.139

Citation:

T. Conard et al., "XPS Study of the Cleaning Efficiency by Ozone Processes of the Protective Films Formed by Reactive Ion Etching of Co and Ti Silicide", Solid State Phenomena, Vols. 65-66, pp. 139-142, 1999

Online since:

November 1998

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