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HomeSolid State PhenomenaSolid State Phenomena Vols. 65-66Comparison of Analytical Methods for Residue...

Comparison of Analytical Methods for Residue Detection of Resist Removal Processes

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Ultra Clean Processing of Silicon Surfaces IV

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Periodical:

Solid State Phenomena (Volumes 65-66)

Pages:

215-218

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.65-66.215

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Online since:

November 1998

Authors:

T. Riihisaari, J. Likonen, Arto Kiviranta, S. Eränen, S. Lehto, J. Tuominen, T. Lindblom, E. Muukkonen

Keywords:

Atomic Force Microscope (AFM), P&T-GC/MS, SIMS

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© 1999 Trans Tech Publications Ltd. All Rights Reserved

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