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HomeSolid State PhenomenaSolid State Phenomena Vols. 65-66Role of UV/Chlorine Exposure during Dry Surface...

Role of UV/Chlorine Exposure during Dry Surface Conditioning before Integrated Epi Deposition Process

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Ultra Clean Processing of Silicon Surfaces IV

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Periodical:

Solid State Phenomena (Volumes 65-66)

Pages:

233-236

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.65-66.233

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Online since:

November 1998

Authors:

Jerzy Ruzyllo, Erika Röhr, Matty Caymax, M. Baeyens, Thierry Conard, Paul W. Mertens, Marc Heyns

Keywords:

Cluster Processing, Dry Cleaning, Low-Temperature Epitaxy, UV/Chlorine

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© 1999 Trans Tech Publications Ltd. All Rights Reserved

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