Paper Titles

Dry Cleaning Technologies Using UV-Excited Radicals and Cryogenic Aerosols
p.219

A New HF Vapor Process for Native Oxide Removal, Suited for Cluster Applications
p.225

Silicon Surface Cleaning for Low Temperature Silicon Epitaxial Growth
p.229

Role of UV/Chlorine Exposure during Dry Surface Conditioning before Integrated Epi Deposition Process
p.233

Electrical Evaluation of the Epi/Substrate Interface Quality after Different In-Situ and Ex-Situ Low-Temperature Pre-Epi Cleaning Methods
p.237

Energy Loss of O1s Photoelectrons in Compositional and Structural Transition Layer at and near the SiO₂/Si Interface
p.241

Metal Enhanced Oxidation of Silicon
p.245

Effect of Si Surface Roughness on the Current-Voltage Characteristics of Ultra-Thin Gate Oxides
p.249

Infrared Absorption Studies of Wet Chemical Oxides: Thermal Evolution of Impurities
p.253

HomeSolid State PhenomenaSolid State Phenomena Vols. 65-66Electrical Evaluation of the Epi/Substrate...

Electrical Evaluation of the Epi/Substrate Interface Quality after Different In-Situ and Ex-Situ Low-Temperature Pre-Epi Cleaning Methods

Article Preview

Abstract:

You might also be interested in these eBooks

Ultra Clean Processing of Silicon Surfaces IV

Info:

Periodical:

Solid State Phenomena (Volumes 65-66)

Pages:

237-240

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.65-66.237

Citation:

Cite this paper

Online since:

November 1998

Authors:

Matty Caymax, S. Decoutere, Erika Röhr, W. Vandervorst, Marc Heyns, H. Sprey, A.B. Storm, J.W. Maes

Keywords:

Epi Cluster, Epi-Substrate Interface, HF/Vapour Cleaning, Pre-Epi Cleaning

Export:

RIS, BibTeX

Price:

Permissions CCC:

Request Permissions

Permissions PLS:

Request Permissions

Сopyright:

© 1999 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation: