Microscopic Analysis of Particle Removal by Gas/Liquid Mixture High-Speed Flow
p.207
p.207
Kelvin-SPV Measurements of Atomically-Flat Si(111) Surfaces Contaminated with Metallic Ions
p.211
p.211
Comparison of Analytical Methods for Residue Detection of Resist Removal Processes
p.215
p.215
Dry Cleaning Technologies Using UV-Excited Radicals and Cryogenic Aerosols
p.219
p.219
A New HF Vapor Process for Native Oxide Removal, Suited for Cluster Applications
p.225
p.225
Silicon Surface Cleaning for Low Temperature Silicon Epitaxial Growth
p.229
p.229
Role of UV/Chlorine Exposure during Dry Surface Conditioning before Integrated Epi Deposition Process
p.233
p.233
Electrical Evaluation of the Epi/Substrate Interface Quality after Different In-Situ and Ex-Situ Low-Temperature Pre-Epi Cleaning Methods
p.237
p.237
Energy Loss of O1s Photoelectrons in Compositional and Structural Transition Layer at and near the SiO2/Si Interface
p.241
p.241
A New HF Vapor Process for Native Oxide Removal, Suited for Cluster Applications
Abstract:
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Periodical:
Solid State Phenomena (Volumes 65-66)
Pages:
225-228
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Online since:
November 1998
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© 1999 Trans Tech Publications Ltd. All Rights Reserved
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