A New HF Vapor Process for Native Oxide Removal, Suited for Cluster Applications

Abstract:

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Periodical:

Solid State Phenomena (Volumes 65-66)

Edited by:

Marc Heyns, Marc Meuris and Paul Mertens

Pages:

225-228

DOI:

10.4028/www.scientific.net/SSP.65-66.225

Citation:

A.B. Storm et al., "A New HF Vapor Process for Native Oxide Removal, Suited for Cluster Applications", Solid State Phenomena, Vols. 65-66, pp. 225-228, 1999

Online since:

November 1998

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Price:

$35.00

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