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The Electrochemical Kinetics of Silicon Surface Corrosion in HF Containing Dilute Solutions
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Optimization of Deionized Water Consumption in Wafer Wet Processing
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HomeSolid State PhenomenaSolid State Phenomena Vols. 65-66Influence of the Dissolved Gas in Cleaning...

Influence of the Dissolved Gas in Cleaning Solution on Silicon Wafer Cleaning Efficiency

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Abstract:

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Ultra Clean Processing of Silicon Surfaces IV

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Periodical:

Solid State Phenomena (Volumes 65-66)

Pages:

43-48

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.65-66.43

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Online since:

November 1998

Authors:

H. Kanetaka, Toshihiko Kujime, H. Yazaki, T. Kezuka, Tadahiro Ohmi

Keywords:

Dissolved Gas, Surfactant, Wet Cleaning

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© 1999 Trans Tech Publications Ltd. All Rights Reserved

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