Influence of the Dissolved Gas in Cleaning Solution on Silicon Wafer Cleaning Efficiency

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Periodical:

Solid State Phenomena (Volumes 65-66)

Edited by:

Marc Heyns, Marc Meuris and Paul Mertens

Pages:

43-48

DOI:

10.4028/www.scientific.net/SSP.65-66.43

Citation:

H. Kanetaka et al., "Influence of the Dissolved Gas in Cleaning Solution on Silicon Wafer Cleaning Efficiency", Solid State Phenomena, Vols. 65-66, pp. 43-48, 1999

Online since:

November 1998

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$35.00

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