Optimization of Deionized Water Consumption in Wafer Wet Processing

Abstract:

Article Preview

Info:

Periodical:

Solid State Phenomena (Volumes 65-66)

Edited by:

Marc Heyns, Marc Meuris and Paul Mertens

Pages:

49-52

DOI:

10.4028/www.scientific.net/SSP.65-66.49

Citation:

I. Kashkoush and R. Novak, "Optimization of Deionized Water Consumption in Wafer Wet Processing", Solid State Phenomena, Vols. 65-66, pp. 49-52, 1999

Online since:

November 1998

Export:

Price:

$35.00

In order to see related information, you need to Login.