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HomeSolid State PhenomenaSolid State Phenomena Vols. 65-66Optimization of Deionized Water Consumption in...

Optimization of Deionized Water Consumption in Wafer Wet Processing

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Ultra Clean Processing of Silicon Surfaces IV

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Periodical:

Solid State Phenomena (Volumes 65-66)

Pages:

49-52

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.65-66.49

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Online since:

November 1998

Authors:

Ismail Kashkoush, R. Novak

Keywords:

Chemical Concentration, De-Ionized Water, Impurity, Particle, Recycling, Rinse Cycle, Surface Contamination, Wet Cleaning

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© 1999 Trans Tech Publications Ltd. All Rights Reserved

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