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Industrial Trends in Wet Processing Technology
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Particle Addition Behaviour of Oxide Stripping by HF Solutions
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HomeSolid State PhenomenaSolid State Phenomena Vols. 65-66Particle Addition Behaviour of Oxide Stripping by...

Particle Addition Behaviour of Oxide Stripping by HF Solutions

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Abstract:

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Ultra Clean Processing of Silicon Surfaces IV

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Periodical:

Solid State Phenomena (Volumes 65-66)

Pages:

35-38

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.65-66.35

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Cite this paper

Online since:

November 1998

Authors:

Enrico Bellandi, Mauro Alessandri, Francesco Pipia, A. Tonti

Keywords:

Cleaning, Etching, HF

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© 1999 Trans Tech Publications Ltd. All Rights Reserved

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