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HomeSolid State PhenomenaSolid State Phenomena Vols. 65-66Single Step Alkaline Cleaning Solution for...

Single Step Alkaline Cleaning Solution for Advanced Semiconductor Cleaning

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Ultra Clean Processing of Silicon Surfaces IV

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Periodical:

Solid State Phenomena (Volumes 65-66)

Pages:

23-26

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.65-66.23

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Online since:

November 1998

Authors:

M. Baeyens, W. Hub, Bernd O. Kolbesen, A.R. Martin, Paul W. Mertens

Keywords:

Complexing Agent, Dilute SC-1, Gate Oxide Integrity, Metal Precipitation, RCA Modification, SC-1 Cleaning

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© 1999 Trans Tech Publications Ltd. All Rights Reserved

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