Paper Titles

Preface and Committees

The Rinsing Problem: Effect of Solute-Surface Interactions on Wafer Purity
p.1

Hydrogenated Ultrapure Water Production System for Future Wet Cleaning Process
p.7

Behaviour of Metallic Contaminants during Mos Processing
p.11

Hydrogen Peroxide Decomposition in Ammonia Solutions
p.15

New Aspects of the Diluted Dynamic Clean Process
p.19

Single Step Alkaline Cleaning Solution for Advanced Semiconductor Cleaning
p.23

Particle Removal Efficiency and Silicon Roughness in HF-DIW/O₃/Megasonics Cleaning
p.27

Industrial Trends in Wet Processing Technology
p.31

HomeSolid State PhenomenaSolid State Phenomena Vols. 65-66Hydrogenated Ultrapure Water Production System for...

Hydrogenated Ultrapure Water Production System for Future Wet Cleaning Process

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Abstract:

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Ultra Clean Processing of Silicon Surfaces IV

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Periodical:

Solid State Phenomena (Volumes 65-66)

Pages:

7-10

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.65-66.7

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Online since:

November 1998

Authors:

Hiroshi Morita, Jun ichi Ida, T. Mizuniwa, Tadahiro Ohmi

Keywords:

Hydrogenated Ultrapure Water, Particle Removal, Wet Cleaning

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© 1999 Trans Tech Publications Ltd. All Rights Reserved

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