Gas-Phase Surface Processing Prior to 3.2 nm Gate Oxidation

Abstract:

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Periodical:

Solid State Phenomena (Volumes 65-66)

Edited by:

Marc Heyns, Marc Meuris and Paul Mertens

Pages:

85-88

DOI:

10.4028/www.scientific.net/SSP.65-66.85

Citation:

J. Ruzyllo et al., "Gas-Phase Surface Processing Prior to 3.2 nm Gate Oxidation", Solid State Phenomena, Vols. 65-66, pp. 85-88, 1999

Online since:

November 1998

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Price:

$35.00

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