New Method to Generate the High Concentration Ozonated Water by Using the Ultrapure Water of the Semiconductor Factory

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Periodical:

Solid State Phenomena (Volumes 76-77)

Edited by:

Marc Heyns, Marc Meuris and Paul Mertens

Pages:

219-222

DOI:

10.4028/www.scientific.net/SSP.76-77.219

Citation:

M. Miyamoto et al., "New Method to Generate the High Concentration Ozonated Water by Using the Ultrapure Water of the Semiconductor Factory", Solid State Phenomena, Vols. 76-77, pp. 219-222, 2001

Online since:

January 2001

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Price:

$35.00

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