The Ozone Solubility and its Decay in Aqueous Solutions: Crucial Issues in Ozonated Chemistries for Semiconductor Cleaning
p.211
p.211
Control of Ozonated Water Cleaning Process for Photoresist Removal
p.215
p.215
New Method to Generate the High Concentration Ozonated Water by Using the Ultrapure Water of the Semiconductor Factory
p.219
p.219
A Controlled Deposition of Organic Contamination and the Removal with Ozone Based Cleanings
p.223
p.223
From Piranha to Barracuda: Mechanism of Ozone and Water Vapor Photoresist Strip in a Wet Bench
p.227
p.227
Photo Resist Stripping Using an Alkaline Accelerator Containing Wet-Vapor
p.231
p.231
Megasonic Silicon Wafer Cleaning and Its Influence on LSI Devices
p.235
p.235
Application of Megasonic Single Wafer Cleaning Technology to LSI Mass Production Line
p.241
p.241
Particle Removal Mechanism of Hydrogenated Ultrapure Water with Megasonic Irradiation
p.245
p.245
From Piranha to Barracuda: Mechanism of Ozone and Water Vapor Photoresist Strip in a Wet Bench
Abstract:
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Periodical:
Solid State Phenomena (Volumes 76-77)
Pages:
227-230
Citation:
Online since:
January 2001
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© 2001 Trans Tech Publications Ltd. All Rights Reserved
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