A Controlled Deposition of Organic Contamination and the Removal with Ozone Based Cleanings
p.223
p.223
From Piranha to Barracuda: Mechanism of Ozone and Water Vapor Photoresist Strip in a Wet Bench
p.227
p.227
Photo Resist Stripping Using an Alkaline Accelerator Containing Wet-Vapor
p.231
p.231
Megasonic Silicon Wafer Cleaning and Its Influence on LSI Devices
p.235
p.235
Application of Megasonic Single Wafer Cleaning Technology to LSI Mass Production Line
p.241
p.241
Particle Removal Mechanism of Hydrogenated Ultrapure Water with Megasonic Irradiation
p.245
p.245
Megasonic, Non-Contact Cleaning Followed by 'Rotagoni' Drying of CMP Wafers
p.251
p.251
Particle Deposition Studies in Acidic Solutions
p.255
p.255
Particle Removal Efficiency Evaluation at 40 nm Using Haze Particle Standard
p.259
p.259
Application of Megasonic Single Wafer Cleaning Technology to LSI Mass Production Line
Abstract:
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Periodical:
Solid State Phenomena (Volumes 76-77)
Pages:
241-244
Citation:
Online since:
January 2001
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Сopyright:
© 2001 Trans Tech Publications Ltd. All Rights Reserved
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