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HomeSolid State PhenomenaSolid State Phenomena Vols. 76-77Particle Removal Efficiency Evaluation at 40 nm...

Particle Removal Efficiency Evaluation at 40 nm Using Haze Particle Standard

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Abstract:

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Ultra Clean Processing of Silicon Surfaces V

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Periodical:

Solid State Phenomena (Volumes 76-77)

Pages:

259-262

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.76-77.259

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Online since:

January 2001

Authors:

Seong Ho Yoo, Benjamin Y.H. Liu, James Sun, Natraj Narayanswami, Gregory P. Thomes

Keywords:

Haze, Wafer Cleaning, Wafer Scanner

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© 2001 Trans Tech Publications Ltd. All Rights Reserved

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