Megasonic, Non-Contact Cleaning Followed by 'Rotagoni' Drying of CMP Wafers

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Periodical:

Solid State Phenomena (Volumes 76-77)

Edited by:

Marc Heyns, Marc Meuris and Paul Mertens

Pages:

251-254

DOI:

10.4028/www.scientific.net/SSP.76-77.251

Citation:

J. M. Lauerhaas et al., "Megasonic, Non-Contact Cleaning Followed by 'Rotagoni' Drying of CMP Wafers", Solid State Phenomena, Vols. 76-77, pp. 251-254, 2001

Online since:

January 2001

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Price:

$35.00

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