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HomeSolid State PhenomenaSolid State Phenomena Vols. 76-77Megasonic, Non-Contact Cleaning Followed by...

Megasonic, Non-Contact Cleaning Followed by 'Rotagoni' Drying of CMP Wafers

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Abstract:

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Ultra Clean Processing of Silicon Surfaces V

Info:

Periodical:

Solid State Phenomena (Volumes 76-77)

Pages:

251-254

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.76-77.251

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Online since:

January 2001

Authors:

Jeffrey M. Lauerhaas, Paul W. Mertens, Tom Nicolosi, Karine Kenis, Wim Fyen, Marc Heyns

Keywords:

Cleaning, Drying, Megasonics, Rotagoni

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© 2001 Trans Tech Publications Ltd. All Rights Reserved

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