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The Role of Oxidant in HF-Based Solution for Noble Metal Removal from Substrate
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Effect of Surface Charge and Fluid Properties on Particle Removal Characteristics of a Surface-Optimized REB Filter
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HomeSolid State PhenomenaSolid State Phenomena Vols. 76-77The Role of Oxidant in HF-Based Solution for Noble...

The Role of Oxidant in HF-Based Solution for Noble Metal Removal from Substrate

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Abstract:

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Ultra Clean Processing of Silicon Surfaces V

Info:

Periodical:

Solid State Phenomena (Volumes 76-77)

Pages:

267-270

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.76-77.267

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Online since:

January 2001

Authors:

Geun Min Choi, Ikunori Yokoi, Tadahiro Ohmi

Keywords:

FOM (HF/O₃), FPM (HF/H₂O₂), Metallic Impurity, Removal Efficiency

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© 2001 Trans Tech Publications Ltd. All Rights Reserved

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