The Role of Oxidant in HF-Based Solution for Noble Metal Removal from Substrate

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Periodical:

Solid State Phenomena (Volumes 76-77)

Edited by:

Marc Heyns, Marc Meuris and Paul Mertens

Pages:

267-270

DOI:

10.4028/www.scientific.net/SSP.76-77.267

Citation:

G. M. Choi et al., "The Role of Oxidant in HF-Based Solution for Noble Metal Removal from Substrate", Solid State Phenomena, Vols. 76-77, pp. 267-270, 2001

Online since:

January 2001

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$35.00

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