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HomeSolid State PhenomenaSolid State Phenomena Vols. 76-77Control of Ozonated Water Cleaning Process for...

Control of Ozonated Water Cleaning Process for Photoresist Removal

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Abstract:

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Ultra Clean Processing of Silicon Surfaces V

Info:

Periodical:

Solid State Phenomena (Volumes 76-77)

Pages:

215-218

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.76-77.215

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Cite this paper

Online since:

January 2001

Authors:

Sang Woo Lim, C.E.D. Chidsey

Keywords:

Ozone Decomposition, Photoresist Removal, Process Optimisation

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© 2001 Trans Tech Publications Ltd. All Rights Reserved

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