Preface, Conference Organisation and Sponsors
Defects and Contamination in Microelectronic Device Production: State-of-the-Art and Prospects
p.1
p.1
The Effect of Ion Implantation on the Metal Contamination of Silicon Surfaces in Aqueous Solution
p.7
p.7
Barium, Strontium and Bismuth Contamination in CMOS Processes
p.9
p.9
An Exploration on the Bridge Formation Mechanism of Cylindrical Storage Poly-Silicon by Water Marks in High Performance 4Gigabit DRAM Capacitor
p.15
p.15
Chemical Processing and Materials Compatibility of High-K Dielectric Materials for Advanced Gate Stacks
p.19
p.19
Wettability Modification of Polysilicon for Stiction Reduction in Silicon Based Micro-electromechanical Structures
p.23
p.23
Dual Gate Oxide for 0.18μm Technologies and Below: Optimization of the Wet Processing Sequence
p.27
p.27
New Aqueous Clean for Aluminum Interconnects: Part I. Fundamentals
p.31
p.31
Barium, Strontium and Bismuth Contamination in CMOS Processes
Abstract:
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Periodical:
Solid State Phenomena (Volumes 76-77)
Pages:
9-14
Citation:
Online since:
January 2001
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Сopyright:
© 2001 Trans Tech Publications Ltd. All Rights Reserved
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