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HomeSolid State PhenomenaSolid State Phenomena Vols. 76-77Dual Gate Oxide for 0.18μm Technologies and Below:...

Dual Gate Oxide for 0.18μm Technologies and Below: Optimization of the Wet Processing Sequence

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Ultra Clean Processing of Silicon Surfaces V

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Periodical:

Solid State Phenomena (Volumes 76-77)

Pages:

27-30

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.76-77.27

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Online since:

January 2001

Authors:

Didier Lévy, Sébastien Petitdidier, H. Bernard, F. Guyader, C. Dezauzier, C. Pizzetti

Keywords:

Dual Gate Oxide, Overetch, Wet Cleaning

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© 2001 Trans Tech Publications Ltd. All Rights Reserved

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