Chemical Processing and Materials Compatibility of High-K Dielectric Materials for Advanced Gate Stacks

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Periodical:

Solid State Phenomena (Volumes 76-77)

Edited by:

Marc Heyns, Marc Meuris and Paul Mertens

Pages:

19-22

DOI:

10.4028/www.scientific.net/SSP.76-77.19

Citation:

J.J. Guan et al., "Chemical Processing and Materials Compatibility of High-K Dielectric Materials for Advanced Gate Stacks", Solid State Phenomena, Vols. 76-77, pp. 19-22, 2001

Online since:

January 2001

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$35.00

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