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HomeSolid State PhenomenaSolid State Phenomena Vols. 76-77Chemical Processing and Materials Compatibility of...

Chemical Processing and Materials Compatibility of High-K Dielectric Materials for Advanced Gate Stacks

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Ultra Clean Processing of Silicon Surfaces V

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Periodical:

Solid State Phenomena (Volumes 76-77)

Pages:

19-22

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.76-77.19

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Online since:

January 2001

Authors:

J.J. Guan, Glenn W. Gale, G. Bersuker, M. Jackson, Howard R. Huff

Keywords:

Chemical Processing, Gate Stack, High-k Dielectrics, Metal-Oxide-Semiconductor Field Effect Transistor (MOSFET)

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© 2001 Trans Tech Publications Ltd. All Rights Reserved

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