Oxygen Ion Bombardment for Local Oxide Formation in Si

D. Krüger; R. Kurps; Peter Formanek; G. Weidner

doi:10.4028/www.scientific.net/SSP.95-96.77

Paper Titles

Effect of Electron Irradiation on Thermal Donors in Oxygen-Doped High-Resistivity FZ Si
p.53

Investigations of the Effect of High Pressure on the Annealing Behavior of Oxygen Related Defects in Silicon
p.59

Simulation of Oxygen Contaminated Silicon Grain Boundaries in Cluster Approximation
p.65

Optimized Parameters for Modeling Oxygen Nucleation in Silicon
p.71

Oxygen Ion Bombardment for Local Oxide Formation in Si
p.77

Nitrogen Diffusion and Interaction with Oxygen in Si
p.83

Structure and Electronic Properties of Nitrogen Defects in Silicon
p.93

Characterization of Nucleation Sites in Nitrogen Doped Czochralski Silicon by Density Functional Theory and Molecular Mechanics
p.99

Processing and Characterization of 300 mm Argon-Annealed Wafers
p.105

HomeSolid State PhenomenaSolid State Phenomena Vols. 95-96Oxygen Ion Bombardment for Local Oxide Formation...

Oxygen Ion Bombardment for Local Oxide Formation in Si

Abstract:

You might also be interested in these eBooks

Gettering and Defect Engineering in Semiconductor Technology X

View Preview

Info:

Periodical:

Solid State Phenomena (Volumes 95-96)

Pages:

77-82

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.95-96.77

Citation:

Cite this paper

Online since:

September 2003

Authors:

D. Krüger, R. Kurps, Peter Formanek, G. Weidner

Keywords:

Defect, Implantation, Oxide Formation, Oxygen, SIMS, TEM

Export:

RIS, BibTeX

Price:

Permissions CCC:

Request Permissions

Permissions PLS:

Request Permissions

Сopyright:

Citation:

References

[1] O.W. Holland, D. Fathy, D. K. Sadana, Appl. Phys. Lett. 69 (1996), p.674.

Google Scholar

[2] Y. Ishikawa, N. Shibata, Jpn. J. Appl. Phys. 30 (1991) p.2427.

Google Scholar

[3] K. Wittmaack, Phil. Trans. R. Soc. Lond. A. 354 (1996), p.2731.

Google Scholar

[4] J. A. Killner, S. D. Littlewood, R. Badheka, M. Wadsworth, J. A. van den Berg, D. G. Armour, Mat. Sci. Engineering, B12 (1992), p.83.

Google Scholar

[5] L. Reimer, Transition Electron Microscopy (Springer, Berlin (1989).

Google Scholar

[6] M.R. McCartney, M. Gajdardziska-Josifovska, Ultramicroscopy 53, 283 (1994).

Google Scholar