Solid State Phenomena

ISSN: 1662-9779

Main Themes

Edited by: Marc Heyns, Paul Mertens and Marc Meuris
Online since: May 2003
Description: The issues addressed by the Sixth International Symposium on the Ultra Clean Processing of Silicon Surfaces included all aspects of ultra-clean Si-technology, cleaning and contamination control in both front-end-of-line (FEOL) and back-end-of-line (BEOL) processing.
Volume is indexed by Thomson Reuters CPCI-S (WoS).
This covered studies of Si-surface chemistry and topography and its relationship to device performance and process yield, cleaning in relationship to new gate stacks, cleaning at the interconnect level, resist stripping and polymer removal, cleaning and contamination control of various new materials, wafer backside cleaning and cleaning following Chemical-Mechanical-Polishing (CMP).


Edited by: P. Sajgalík, M. Drábik and S. Varga
Online since: April 2003
Description: Volume is indexed by Thomson Reuters CPCI-S (WoS).
This book features 100 refereed papers, grouped under the following six headings: Advanced Synthesis & Characterization Techniques of Materials, Structure & Electron Structure of Solids, Chemistry of Glasses, Novel Inorganic Materials, Layered Compounds, Clathrates & Intercalates, Deposited Films & Surface Chemistry.


Edited by: L.B. Magalas
Online since: February 2003
Description: Volume is indexed by Thomson Reuters CPCI-S (WoS).
This book comprises the proceedings of the Second International School on Mechanical Spectroscopy; presented here as invited lectures (Part I) and contributed papers (Part II). After having originated merely as a technique for the study of internal friction, mechanical spectroscopy has developed strongly, during the past decade, into a tool which is now indispensable for making advances in the creation of new materials. This book will therefore provide an excellent reference source for every researcher working in the field.


Edited by: G. Neumann and C. Tuijn
Online since: November 2002
Description: The systematic investigation of self-diffusion and impurity diffusion in metals began as a result of the availability of a wide variety of artificial radio- isotopes following the Second World War. During the following years, rapid advances in the theory of solid-state diffusion and the ever-increasing number of experimental data were comprehensively described in any number of textbooks and review papers. But impurity diffusion in metals was more or less superficially treated in the textbooks, and some of the review papers, with the result that - even up to now - a comprehensive review of the correct interpretation of impurity diffusion in metals has been lacking.


Edited by: P. Klimanek, A.E. Romanov, B.M. Seefeldt
Online since: February 2002
Description: Volume is indexed by Thomson Reuters CPCI-S (WoS).
The last few years have witnessed a rapidly growing interest in the explanation and interpretation of the mesoscale microstructures which occur in distorted crystalline objects such as, for instance, conventional plastically deformed metals and alloys, as well as high-performance materials including ultra-fine grained polycrystals, nanocrystals and thin films.


Edited by: S. Pizzini
Online since: December 2001
Description: Modern semiconductor devices rely upon precise defect engineering. On the one hand: defects are the components needed to generate the electronic architecture of the device. On the other hand: they may – if not carefully controlled– induce failure of that device. During the past fifty years, the electrical and optical properties of defects, their generation, transport, clustering and reactions between them have been investigated intensively. Yet the development of semiconductor technology remains closely connected to the advances made in defect science and engineering. Compared to metals, defect control in silicon is significantly complicated by the open structure of its lattice. As a result, reactions between defects, even at room temperature, have become a central issue in defect engineering.


Edited by: V. Raineri, F. Priolo, M. Kittler and H. Richter
Online since: November 2001
Description: Gettering and Defect Engineering in Semiconductor Technology are discussed here,with particular emphasis being placed on device applications. Fundamental aspects,as well as technological problems which are associated with defects in electronic materials and devices, are addressed.
Volume is indexed by Thomson Reuters CPCI-S (WoS).
The topics in this volume were selected on the basis that single-crystal Si, and Si-based, semiconductors will dominate microelectronics until far into the 21st century. The main reason for the overwhelming success of silicon technology is economic: the production cost per area increases by a factor of 5, or even 10, on going from 200 mm Si wafers to compound semiconductors or other substrate materials.


Edited by: O. Bonnaud, T. Mohammed-Brahim, H.P. Strunk and J.H. Werner
Online since: November 2001
Description: This book comprises the contributions to the sixth conference on polycrystalline semiconductors (POLYSE).
Volume is indexed by Thomson Reuters CPCI-S (WoS).
The conference covered many aspects of polycrystalline semiconductors, but was more applications-oriented than on previous occasions; thereby reflecting the rapid evolution of these technologies. POLYSE 2000 brought together research specialists from >basic research, as well as from research & development engineering, all of whom are working on devices such as thin-film transistors, micro-electromechanical systems, or sensors and actuators. In particular, ten internationally recognized scientists (J. Morante, S.Périchon, M. Konagai, S. Wagner, R. Hagenbeck, D.A. Bonnell, G. Horowitz, T.Fuyuki, J. Kocka and V. Chuwere) were invited to review their work on several interesting and promising aspects of the subject: such as, micro-systems, solar cells, thin-film transistors, organic polycrystalline devices and polycrystalline ceramics.


Edited by: H. Tomokage and T. Sekiguchi
Online since: April 2001
Description: The characterisation of semiconductors is of key importance in preparing and applying semiconductors in industry.
Volume is indexed by Thomson Reuters CPCI-S (WoS).
The present work deals with theoretical and experimental topics which are related to the assessment of microstructures in semiconductors by means of beam injection and related methods.


Edited by: Marc Heyns, Marc Meuris and Paul Mertens
Online since: January 2001
Description: Volume is indexed by Thomson Reuters CPCI-S (WoS).
The proceedings of the Fifth International Symposium on Ultra Clean Processing of Silicon Surfaces cover all aspects of ultra-clean Si-technology: cleaning, contamination control, Si-surface chemistry and topography, and its relationship to device performance and process yield. New areas of concern include: cleaning at the interconnect level, resist strip and polymer removal (dry and wet), cleaning and contamination aspects of metallization, wafer backside cleaning and cleaning after Chemical-Mechanical-Polishing (CMP).


Showing 161 to 170 of 213 Main Themes