[1]
D. Vázquez-Cortés, E. Cruz-Hernández, V.H. Méndez-García, S. Shimomura, M. López-López, Optical and electrical properties of Si-doped GaAs films grown on (631)-oriented substrates, J. Vac . Sci. Technol B, 30. 2 (2012): 02B125.
DOI: 10.1116/1.3687904
Google Scholar
[2]
J.Y. Leem, C.R. Lee, S.K. Noh, RHEED oscillation studies of pseudomorphic InGaAs strained layers on GaAs substrate, J. Cryst. Growth, 197. 1 (1999): 84-88.
DOI: 10.1016/s0022-0248(98)00939-7
Google Scholar
[3]
J. Nagle, R.J. Malik, D. Gershoni, A comparison of atomic carbon versus beryllium acceptor doping in GaAs grown by molecular beam epitaxy, J. Cryst. Growth, 111. 1 (1991): 264-268.
DOI: 10.1016/0022-0248(91)90982-b
Google Scholar
[4]
D.H. Zhang, K. Radhakrishnan, S.F. Yoon, Characterization of beryllium-doped molecular beam epitaxial grown GaAs by photoluminescence, J. Cryst. Growth, 148. 1 (1995): 35-40.
DOI: 10.1016/0022-0248(94)00871-x
Google Scholar
[5]
S.V. Ivanov, P.S. Kop'ev, N.N. Ledentsov, Interplay of beryllium segregation and diffusion in heavily doped GaAs and AlGaAs grown by molecular beam epitaxy (thermodynamic analysis), J. Cryst. Growth, 108. 3 (1991): 661-669.
DOI: 10.1016/0022-0248(91)90246-2
Google Scholar
[6]
J. Xu, E. Towe, Q. Yuan, R. Hull, Beryllium doping and silicon amphotericity in (110) GaAs-based heterostructures: structural and optical properties, J. Cryst. Growth, 196. 1 (1999): 26-32.
DOI: 10.1016/s0022-0248(98)00871-9
Google Scholar
[7]
K.Y. Cheng, A.Y. Cho and W.A. Bonner, Beryllium doping in Ga0. 47In0. 53As and Al0. 48In0. 52 As grown by molecular‐beam epitaxy, J. Appl. Phys. 52. 7 (1981): 4672-4675.
DOI: 10.1063/1.329349
Google Scholar
[8]
C.S. Lent and P.I. Cohen, Diffraction from stepped surfaces: I. Reversible surfaces, Surf. Sci. 139. 1 (1984): 121-154.
DOI: 10.1016/0039-6028(84)90013-x
Google Scholar
[9]
Y. limura and M. Kawabe, Be doping effect on growth kinetics of GaAs grown by MBE, Jap. J. Appl. Phys. 25. 1A (1986): L81.
DOI: 10.1143/jjap.25.l81
Google Scholar
[10]
J.S. Kim, I.H. Bae, J.Y. Leem, S.K. Noh, J.I. Lee, J.S. Kim, S.M. Kim, J.S. Son, M. Jeon, Properties of Mg doped GaAs grown by molecular beam epitaxy, J. Cryst. Growth, 226. 1 (2001): 52-56.
DOI: 10.1016/s0022-0248(01)01364-1
Google Scholar
[11]
K. Saito, E. Tokumitsu, T. Akatsuka, M. Miyauchi, T. Yamada, M. Konagai, K. Takahashi, Characterization of p‐type GaAs heavily doped with carbon grown by metalorganic molecular‐beam epitaxy, J. Appl. Phys, 64. 8 (1988): 3975-3979.
DOI: 10.1063/1.341356
Google Scholar
[12]
S.G. Ihn, M.Y. Ryu, J.I. Song, Optical properties of undoped, Be-doped, and Si-doped wurtzite-rich GaAs nanowires grown on Si substrates by molecular beam epitaxy, Solid. State. Commun, 150. 15 (2010): 729-733.
DOI: 10.1016/j.ssc.2010.01.037
Google Scholar
[13]
J. Singh, Physics of Semiconductors and their Heterostructures, McGraw-Hill Book Co., Singapore, 1996, p.169.
Google Scholar