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3D SOI Elements for System-on-Chip Applications
Abstract:
Base technology of local 3D SOI-structures formation has been proposed. Using this technology the electrical characteristics were developed and simulated of following original device elements for the microsystem applications: standard and matrix SOI CMOS-transistors with 3D gates, switching elements on Schottky diodes, contact electrodes with 3D surface, elements for highly sensitive integral accelerometers with registration of a field emission current, hermetical microcavities and microchannels under the surface of a SOI-substrate, field emission silicon microcathodes.
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137-144
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July 2011
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© 2011 Trans Tech Publications Ltd. All Rights Reserved
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