Effect of Ge Nanoislands on Lateral Photoconductivity of Ge-SiOX-Si Structures

Abstract:

Article Preview

The results of the experimental studies of the effect of nanoislands on the lateral photoconductivity in structures with Ge nanoislands formed on the SiOx layer using molecular beam epitaxy are reported. It is shown that nanoislands increase the surface recombination rate and affect the fundamental absorption edge of c-Si. The generation of lateral photocurrent in the range 0.8 – 1.0 eV was observed due to transitions between tails in the density of states of the near-surface c-Si, which is described by Urbach dependence. It was shown that the absorption spectrum of nanoislands is typical for the disordered Ge and is due to transitions between density-of-states tails of the valence and conductance bands. The mechanism is proposed of lateral photoconductivity involving the non-equilibrium charge carriers, generated in Ge nanoislands. It is suggested that the optical absorption and lateral photocurrent in Ge-SiOx-Si structures are affected by fluctuations of the surface potential in the near-surface region of c-Si, fluctuations of the Si band gap width and by effects of disorder in Ge nanoislands.

Info:

Periodical:

Edited by:

Alexei N. Nazarov and Jean-Pierre Raskin

Pages:

179-186

DOI:

10.4028/www.scientific.net/AMR.276.179

Citation:

V.S. Lysenko et al., "Effect of Ge Nanoislands on Lateral Photoconductivity of Ge-SiOX-Si Structures", Advanced Materials Research, Vol. 276, pp. 179-186, 2011

Online since:

July 2011

Export:

Price:

$35.00

In order to see related information, you need to Login.

In order to see related information, you need to Login.