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HomeMaterials Science ForumMaterials Science Forum Vols. 258-263Formation Kinetics of the Al-Related Shallow...

Formation Kinetics of the Al-Related Shallow Thermal Donors: A Probe for Oxygen Diffusion in Silicon

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Defects in Semiconductors 19

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Periodical:

Materials Science Forum (Volumes 258-263)

Pages:

1761-1766

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.258-263.1761

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Online since:

December 1997

Authors:

P. Kaczor, L. Dobaczewski, T. Gregorkiewicz, C.A.J. Ammerlaan

Keywords:

Defect Reactions, Oxygen Diffusion in Silicon, Shallow Thermal Donors

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© 1997 Trans Tech Publications Ltd. All Rights Reserved

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