Formation Kinetics of the Al-Related Shallow Thermal Donors: A Probe for Oxygen Diffusion in Silicon

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Periodical:

Materials Science Forum (Volumes 258-263)

Edited by:

Gordon Davies and Maria Helena Nazaré

Pages:

1761-1766

DOI:

10.4028/www.scientific.net/MSF.258-263.1761

Citation:

P. Kaczor et al., "Formation Kinetics of the Al-Related Shallow Thermal Donors: A Probe for Oxygen Diffusion in Silicon", Materials Science Forum, Vols. 258-263, pp. 1761-1766, 1997

Online since:

December 1997

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$35.00

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