Ab-Initio Investigations on Diffusion of Halogen Atoms in GaAs

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Periodical:

Materials Science Forum (Volumes 258-263)

Edited by:

Gordon Davies and Maria Helena Nazaré

Pages:

1821-1826

DOI:

10.4028/www.scientific.net/MSF.258-263.1821

Citation:

T. Ohno et al., "Ab-Initio Investigations on Diffusion of Halogen Atoms in GaAs", Materials Science Forum, Vols. 258-263, pp. 1821-1826, 1997

Online since:

December 1997

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$35.00

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