AlN Deposition by OMVPE and PLD Used as an Encapsulate for Ion Implanted SiC

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Periodical:

Materials Science Forum (Volumes 264-268)

Edited by:

G. Pensl, H. Morkoç, B. Monemar and E. Janzén

Pages:

1243-1246

DOI:

10.4028/www.scientific.net/MSF.264-268.1243

Citation:

K. A. Jones et al., "AlN Deposition by OMVPE and PLD Used as an Encapsulate for Ion Implanted SiC", Materials Science Forum, Vols. 264-268, pp. 1243-1246, 1998

Online since:

February 1998

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$35.00

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