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HomeMaterials Science ForumMaterials Science Forum Vols. 264-268Reactive UHV Sputtering and Structural...

Reactive UHV Sputtering and Structural Characterization of Epitaxial AlN/6H-SiC(0001) Thin Films

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Periodical:

Materials Science Forum (Volumes 264-268)

Pages:

1225-1228

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.264-268.1225

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Online since:

February 1998

Authors:

Sukkaneste Tungasmita, Jens Birch, L. Hultman, Erik Janzén, J.-E. Sundgren

Keywords:

6H-SiC, Aluminum Nitride (AlN), High Resolution Transmission Electron Microscopy, SIMS, Sputtering, Thin Film, X-Ray Diffraction (XRD)

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© 1998 Trans Tech Publications Ltd. All Rights Reserved

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