Growth and Characterization of SiC Films on Large-Area Si Wafers by APCVD - Temperature Dependence

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Periodical:

Materials Science Forum (Volumes 264-268)

Edited by:

G. Pensl, H. Morkoç, B. Monemar and E. Janzén

Pages:

179-182

DOI:

10.4028/www.scientific.net/MSF.264-268.179

Citation:

C.-H. Wu et al., "Growth and Characterization of SiC Films on Large-Area Si Wafers by APCVD - Temperature Dependence", Materials Science Forum, Vols. 264-268, pp. 179-182, 1998

Online since:

February 1998

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$35.00

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