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HomeMaterials Science ForumMaterials Science Forum Vols. 287-288Ion Sputtering of Metals in a System with a...

Ion Sputtering of Metals in a System with a Thermionic Inert Gas Plasma Source

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Periodical:

Materials Science Forum (Volumes 287-288)

Pages:

303-306

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.287-288.303

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Online since:

August 1998

Authors:

V.A. Belous, G.I. Nosov

Keywords:

Discharge, Energy Efficiency, Etching Rate, Gas Plasma Source, Inert Gas, Ions, Sputtering, Thermionic Cathode

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© 1998 Trans Tech Publications Ltd. All Rights Reserved

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