An UHV-Compatible DC Off-Axis Sputtering Device for Reactive Sputtering and Investigation of the Plasma Properties during Niobium Deposition

Abstract:

Article Preview

Info:

Periodical:

Materials Science Forum (Volumes 287-288)

Edited by:

Horst Hoffmann

Pages:

319-322

Citation:

A. Krämer et al., "An UHV-Compatible DC Off-Axis Sputtering Device for Reactive Sputtering and Investigation of the Plasma Properties during Niobium Deposition", Materials Science Forum, Vols. 287-288, pp. 319-322, 1998

Online since:

August 1998

Export:

Price:

$38.00

Fetching data from Crossref.
This may take some time to load.