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HomeMaterials Science ForumMaterials Science Forum Vols. 287-288An UHV-Compatible DC Off-Axis Sputtering Device...

An UHV-Compatible DC Off-Axis Sputtering Device for Reactive Sputtering and Investigation of the Plasma Properties during Niobium Deposition

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Periodical:

Materials Science Forum (Volumes 287-288)

Pages:

319-322

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.287-288.319

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Online since:

August 1998

Authors:

A. Krämer, H. Hammer, André Schneider

Keywords:

DC Magnetron Sputtering, Niobium, Niobium Nitrides, Non-Reactive Sputtering, Plasma Properties, Reactive Sputtering

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© 1998 Trans Tech Publications Ltd. All Rights Reserved

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