An UHV-Compatible DC Off-Axis Sputtering Device for Reactive Sputtering and Investigation of the Plasma Properties during Niobium Deposition

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Periodical:

Materials Science Forum (Volumes 287-288)

Edited by:

Horst Hoffmann

Pages:

319-322

DOI:

10.4028/www.scientific.net/MSF.287-288.319

Citation:

A. Krämer et al., "An UHV-Compatible DC Off-Axis Sputtering Device for Reactive Sputtering and Investigation of the Plasma Properties during Niobium Deposition", Materials Science Forum, Vols. 287-288, pp. 319-322, 1998

Online since:

August 1998

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$35.00

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