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HomeMaterials Science ForumMaterials Science Forum Vols. 338-342Investigation into the Film Growth of AlN on SiC...

Investigation into the Film Growth of AlN on SiC by Low Pressure Chemical Vapour Deposition

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Silicon Carbide and Related Materials - 1999

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Periodical:

Materials Science Forum (Volumes 338-342)

Pages:

1507-1510

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.338-342.1507

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Online since:

May 2000

Authors:

V. Williams, Etienne Pernot, E. Ramberg, Elisabeth Blanquet, Jean Marie Bluet, Roland Madar

Keywords:

Chemical Vapor Deposition (CVD), Sublimation, Surface Etching

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© 2000 Trans Tech Publications Ltd. All Rights Reserved

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