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HomeMaterials Science ForumMaterials Science Forum Vols. 338-342Low-Energy-Ion-Assisted Reactive Sputter...

Low-Energy-Ion-Assisted Reactive Sputter Deposition of Epitaxial AlN Thin Films on 6H-SiC

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Silicon Carbide and Related Materials - 1999

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Periodical:

Materials Science Forum (Volumes 338-342)

Pages:

1519-1522

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.338-342.1519

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Online since:

May 2000

Authors:

Sukkaneste Tungasmita, P.O.Å. Persson, K. Järrendahl, L. Hultman, Jens Birch

Keywords:

6H-SiC, Aluminum Nitride (AlN), Cathodoluminescence, Epitaxial, Sputtering, TEM, X-Ray Diffraction (XRD)

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© 2000 Trans Tech Publications Ltd. All Rights Reserved

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